| PMT-16 Precious Metal Wafer Electroplating System Wafers up to 10" x 10" (250 x 250 mm) Gold, Gold-Alloy Silver, Silver Alloy Tungsten, Tungsten Alloy Palladium, Palladium Alloy Rhodium, Rhodium Alloy
Features
- One Plating Cell
- High/Flow/Filtration (enhanced filtration yields fewer defects)
- Increased filtration speeds shim production
- Microprocessor controlled
- Repeatability for uniform results
- Precise control of plating thickness and thickness variation
- Ergonomically designed
- Easy process maintenance
Optional Reverse Pulse Plating - RPP |

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| Specifications | | Equipment Dimensions Wafer dimensions Standard Total Solution Volume Heaters Temperature Control Cells | 580 x 920 x 1220 mm (L x W xH) 4,6, and 8" round or square 16 Liters 1kW +/- 1 degree 1 | | Each cell | | ElectricalExhaustDI Water | 200-230 VAC, 16 A, 1 Phase, 50/60 hz.400 CFM>17 Meg-Ohm, 1/2" 45 psi, 50 lpm on demand | | Each cell | | Pump Plating Current Filtration
| 1/2 HP
0 to 27 Amps
Single 10" .45 micron |
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